DocumentCode :
922705
Title :
Geometric factor for Hall mobility characterization using the van der Pauw dual configuration
Author :
Nathan, Arokia ; Allegretto, Walter
Author_Institution :
Dept. of Electr. & Comput. Eng., Waterloo Univ., Ont., Canada
Volume :
40
Issue :
8
fYear :
1993
fDate :
8/1/1993 12:00:00 AM
Firstpage :
1508
Lastpage :
1511
Abstract :
A geometric factor applicable to a wide range of device geometries of the van der Pauw dual configuration is presented. Such a configuration allows a direct retrieval of the Hall mobility in a single measurement of the magnetic-field-induced imbalance in output current. In view of scaling considerations, the geometric factor is characterized simply in terms of device aspect ratio (L/W) and relative electrode separation (d/W). The geometric factor, which is based on numerical computations, overcomes the limitations inherent in the existing form that has been analytically obtained for an infinitesimally small electrode separation. Hence, it is now possible to design practical device geometries which readily lend themselves to in situ measurement and characterization of the material or process in question, without being constrained by photolithography limitations
Keywords :
Hall effect; carrier mobility; semiconductor device models; Hall mobility characterization; device aspect ratio; device geometries; geometric factor; magnetic-field-induced imbalance; output current; photolithography limitations; relative electrode separation; van der Pauw dual configuration; Current measurement; Density estimation robust algorithm; Electrodes; Geometry; Hall effect; Lorentz covariance; Magnetic field measurement; Magnetic materials; Magnetic separation; Semiconductor materials;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.223712
Filename :
223712
Link To Document :
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