DocumentCode :
922803
Title :
A new drain-current injection technique for the measurement of off-state breakdown voltage in FETs
Author :
Bahl, Sandeep R. ; Del Alamo, Jesus A.
Author_Institution :
MIT, Cambridge, MA, USA
Volume :
40
Issue :
8
fYear :
1993
fDate :
8/1/1993 12:00:00 AM
Firstpage :
1558
Lastpage :
1560
Abstract :
A simple three-terminal technique for measuring the off-state breakdown voltage of FETs is presented. With the source grounded, current is injected into the drain of the on-state device. The gate is then ramped down to shut the device off. In this process, the drain-source voltage rises to a peak and then drops. This peak represents an unambiguous definition of three-terminal breakdown voltage. In the same scan, a measurement of the two-terminal gate-drain breakdown voltage is also obtained. The method offers potential for use in a manufacturing environment, as it is fully automatable. It also enables easy measurement of breakdown voltage in unstable and fragile devices
Keywords :
electric breakdown of solids; field effect transistors; semiconductor device testing; drain-current injection technique; drain-source voltage; fragile devices; manufacturing environment; off-state breakdown voltage; three-terminal technique; two-terminal gate-drain breakdown voltage; Conductivity; Contacts; Crystals; Electron devices; FETs; Gold; Impurities; Leakage current; P-n junctions; Transistors;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.223723
Filename :
223723
Link To Document :
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