DocumentCode :
922834
Title :
Fabrication of InGaAsP Double Shallow Ridge Rectangular Ring Laser With Total Internal Reflection Mirror by Cascade Etching Technique
Author :
Zhang, R. ; Ren, Z. ; Yu, S.
Author_Institution :
Bristol Univ., Bristol
Volume :
19
Issue :
21
fYear :
2007
Firstpage :
1714
Lastpage :
1716
Abstract :
InGaAsP double shallow ridge rectangular ring laser photonics integration circuits have been successfully fabricated by cascade etching technique. Varied thresholds with coupling current Ic and coupling length Lc are observed. The lowest threshold current of 75 mA, including Ic and Id, at Ic = 30 mA in the device of Lc = 300 mum is obtained. The device of Lc = 200 mum exhibits single-mode operation with sidemode suppression ratio = 15 dB and Q = 6513 just beyond the threshold. The cascade etching technique is of interest for fabrication of other multilayer monolithic photonic integration circuits.
Keywords :
gallium arsenide; indium compounds; laser beam etching; quantum well lasers; ring lasers; InGaAsP - Interface; cascade etching; current 75 mA; double shallow ridge rectangular ring laser; photonics integration circuits; total internal reflection mirror; Coupling circuits; Etching; Mirrors; Nonhomogeneous media; Optical device fabrication; Optical reflection; Photonics; Quantum cascade lasers; Ring lasers; Threshold current; Double shallow ridge; InGaAsP–InP; reactive ion/inductance coupled plasma (ICP) etching; rectangular ring laser; total internal reflection;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/LPT.2007.905059
Filename :
4343136
Link To Document :
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