مرکز منطقه ای اطلاع رساني علوم و فناوري - Erratum: Boron redistribution at the oxide--silicon interface during drive-in in oxidising atmospheres

DocumentCode :

923515

Title :

Erratum: Boron redistribution at the oxide--silicon interface during drive-in in oxidising atmospheres

Author :

Masetti, Guido ; Solmi, S. ; Soncini, G.

Volume :

Issue :

fYear :

1973

Firstpage :

380

Keywords :

boron; oxidation; semiconductor doping; semiconductor-insulator boundaries; B; boron redistribution; oxidation; semiconductor doping; semiconductor insulator boundaries;

fLanguage :

English

Journal_Title :

Electronics Letters

Publisher :

iet

ISSN :

0013-5194

Type :

jour

DOI :

10.1049/el:19730281

Filename :

4236229

Link To Document :

https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=923515