• DocumentCode
    924564
  • Title

    4H-SiC power bipolar junction transistor with a very low specific ON-resistance of 2.9 m/spl Omega//spl middot/cm2

  • Author

    Jianhui Zhang ; Alexandrov, P. ; Burke, T. ; Zhao, J.H.

  • Author_Institution
    United Silicon Carbide Inc., New Brunswick, NJ, USA
  • Volume
    27
  • Issue
    5
  • fYear
    2006
  • fDate
    5/1/2006 12:00:00 AM
  • Firstpage
    368
  • Lastpage
    370
  • Abstract
    This letter reports a newly achieved best result on the specific ON-resistance (R/sub SP/spl I.bar/ON/) of power 4H-SiC bipolar junction transistors (BJTs). A 4H-SiC BJT based on a 12-μm drift layer shows a record-low specific-ON resistance of only 2.9 m/spl Omega//spl middot/cm2, with an open-base collector-to-emitter blocking voltage (V/sub ceo/) of 757 V, and a current gain of 18.8. The active area of this 4H-SiC BJT is 0.61 mm2, and it has a fully interdigitated design. This high-performance 4H-SiC BJT conducts up to 5.24 A at a forward voltage drop of V/sub CE/=2.5 V, corresponding to a low R/sub SP-ON/ of 2.9 m/spl Omega//spl middot/cm2 up to J/sub c/=859 A/cm2. This is the lowest specific ON-resistance ever reported for high-power 4H-SiC BJTs.
  • Keywords
    power bipolar transistors; silicon compounds; 12 micron; 18.8 dB; 2.5 V; 4H-SiC BJT; 757 V; SiC; bipolar junction transistor; power transistors; silicon carbide; Fabrication; Low voltage; Material properties; Photonic band gap; Power transistors; Silicon carbide; Bipolar junction transistors (BJTs); power transistors; silicon carbide;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2006.873370
  • Filename
    1626459