DocumentCode :
926899
Title :
Performance of Deep Ultraviolet GaN Avalanche Photodiodes Grown by MOCVD
Author :
Shen, Shyh-Chiang ; Zhang, Yun ; Yoo, Dongwon ; Limb, Jae-Boum ; Ryou, Jae-Hyun ; Yoder, Paul D. ; Dupuis, Russell D.
Author_Institution :
Georgia Inst. of Technol., Atlanta
Volume :
19
Issue :
21
fYear :
2007
Firstpage :
1744
Lastpage :
1746
Abstract :
We report high-performance GaN ultraviolet (UV) p-i-n avalanche photodiodes (APDs) fabricated on bulk GaN substrates. The fabricated GaN p-i-n diodes demonstrated optical gains > 104 and low dark current densities operating at wavelengths from 280 to 360 nm. The result is among the highest III-N-based APD gains at the deep UV wavelength of 280 nm reported to date.
Keywords :
III-V semiconductors; MOCVD coatings; avalanche photodiodes; current density; gallium compounds; p-i-n photodiodes; photodetectors; semiconductor growth; wide band gap semiconductors; GaN; MOCVD; current densities; deep ultraviolet p-i-n avalanche photodiodes; semiconductor growth; wavelength 280 nm to 360 nm; Absorption; Avalanche photodiodes; Dark current; Fabrication; Gallium nitride; MOCVD; P-i-n diodes; Photodetectors; Sensor arrays; Substrates; Avalanche photodiode (APD); GaN; PIN; deep ultraviolet (DUV);
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/LPT.2007.906052
Filename :
4346597
Link To Document :
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