DocumentCode
927313
Title
Vapor phase epitaxial materials for LED applications
Author
Craford, M. George ; Groves, W.O.
Author_Institution
Monsanto Commercial Products Company, St. Louis, Mo.
Volume
61
Issue
7
fYear
1973
fDate
7/1/1973 12:00:00 AM
Firstpage
862
Lastpage
880
Abstract
The growth and performance of vapor phase epitaxial (VPE) III-V materials and devices for light-emitting diode (LED) and display applications are reviewed. Because of the commercial importance of the GaAsP ternary alloys and GaP, this paper is primarily concerned with these materials. With the addition of nitrogen doping high-performance red, yellow, and green devices can be fabricated using GaAsP and GaP. The VPE materials growth technology is highly developed, and, in conjunction with the Zn diffusion techniques used to form the p-n junctions, is compatible with planar processing procedures similar to those commonly used in the Si integrated-circuit industry. This processing technology results in reproducible and economical LED devices. In this paper the performance of VPE GaAsP devices is compared with the performance of other types of LED´s, and economic considerations involved in the fabrication of LED devices are discussed.
Keywords
Defense industry; Displays; Doping; Fabrication; Gallium nitride; III-V semiconductor materials; Light emitting diodes; Nitrogen; Textile industry; Zinc;
fLanguage
English
Journal_Title
Proceedings of the IEEE
Publisher
ieee
ISSN
0018-9219
Type
jour
DOI
10.1109/PROC.1973.9175
Filename
1451105
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