• DocumentCode
    927313
  • Title

    Vapor phase epitaxial materials for LED applications

  • Author

    Craford, M. George ; Groves, W.O.

  • Author_Institution
    Monsanto Commercial Products Company, St. Louis, Mo.
  • Volume
    61
  • Issue
    7
  • fYear
    1973
  • fDate
    7/1/1973 12:00:00 AM
  • Firstpage
    862
  • Lastpage
    880
  • Abstract
    The growth and performance of vapor phase epitaxial (VPE) III-V materials and devices for light-emitting diode (LED) and display applications are reviewed. Because of the commercial importance of the GaAsP ternary alloys and GaP, this paper is primarily concerned with these materials. With the addition of nitrogen doping high-performance red, yellow, and green devices can be fabricated using GaAsP and GaP. The VPE materials growth technology is highly developed, and, in conjunction with the Zn diffusion techniques used to form the p-n junctions, is compatible with planar processing procedures similar to those commonly used in the Si integrated-circuit industry. This processing technology results in reproducible and economical LED devices. In this paper the performance of VPE GaAsP devices is compared with the performance of other types of LED´s, and economic considerations involved in the fabrication of LED devices are discussed.
  • Keywords
    Defense industry; Displays; Doping; Fabrication; Gallium nitride; III-V semiconductor materials; Light emitting diodes; Nitrogen; Textile industry; Zinc;
  • fLanguage
    English
  • Journal_Title
    Proceedings of the IEEE
  • Publisher
    ieee
  • ISSN
    0018-9219
  • Type

    jour

  • DOI
    10.1109/PROC.1973.9175
  • Filename
    1451105