DocumentCode :
927337
Title :
A new method of growing GaP crystals for light-emitting diodes
Author :
Kaneko, Kunio ; Ayabe, Masaaki ; Dosen, Masashi ; Morizane, Kenji ; Usui, Setsuo ; Watanabe, Naozo
Author_Institution :
Sony Corporation Research Center, Yokohama, Japan
Volume :
61
Issue :
7
fYear :
1973
fDate :
7/1/1973 12:00:00 AM
Firstpage :
884
Lastpage :
890
Abstract :
A method named synthesis, solute diffusion (SSD) has been developed for growing compound semiconductor crystals, GaP in particular, for light-emitting diode (LED) use. The grown crystal is cylindrically shaped and is composed of fairly large-size grains. Growth rate is limited by the diffusion process of phosphorus in the gallium melt. The diffusion coefficient was obtained from the growth rate and found to be 8×10-5cm2s-1at 1100°C with an activation energy of 0.65 eV. Donor impurities, tellurium or sulfur, can be reproducibly incorporated from 3×1017to 4×1018cm-3, with segregation coefficients at 1150°C, 0.038 and 1.0, respectively. The quality of the grown crystals was observed to be exceptionally good, and the saucer-type pits were hardly observable in the crystal on modified AB etching. Highly efficient red-light-emitting junctions were reproducibly grown by only one single-layer-single-liquid-epitaxy process, in which zinc was doped from the vapor phase. A double-layer-single-epitaxy process, which we call "liquid epitaxial grown-in junction" process, was also developed and it produced highly efficient green LED\´s. The LED\´s grown on the SSD wafers have efficiencies up to 7.4 percent for red and 0.15 percent for green.
Keywords :
Crystals; Etching; Gallium arsenide; III-V semiconductor materials; Impurities; Lattices; Light emitting diodes; Substrates; Tellurium; Temperature;
fLanguage :
English
Journal_Title :
Proceedings of the IEEE
Publisher :
ieee
ISSN :
0018-9219
Type :
jour
DOI :
10.1109/PROC.1973.9177
Filename :
1451107
Link To Document :
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