DocumentCode
928483
Title
Surface morphology of liquid-phase-epitaxial InP
Author
Guha, Saikat ; Majerfeld, A. ; Moyes, N. ; Robson, P.N.
Author_Institution
University of Sheffield, Department of Electronic & Electrical Engineering, Sheffield, UK
Volume
11
Issue
14
fYear
1975
Firstpage
303
Lastpage
304
Abstract
It is shown that misorientation of a substrate from a lowest index plane even by 0.1° results in epitaxial layers having lamellar surface structure and indium inclusions. Smooth layers can be grown from a supercooled melt on nominally oriented (±1°) (111) B planes. For (100) substrates, exact orientation (±0.1°) and melt supercooling are necessary to grow smooth layers.
Keywords
III-V semiconductors; crystal growth from melt; epitaxial growth; indium compounds; semiconductor growth; surface structure; epitaxial layers; lamellar surface structure; liquid phase epitaxial InP; supercooled melt; surface morphology;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19750229
Filename
4236748
Link To Document