• DocumentCode
    929630
  • Title

    The design of a microwave plasma cavity

  • Author

    Asmussen, Jes, Jr. ; Mallavarpu, Raghuveer ; Hamann, John R. ; Park, Hee Chung

  • Author_Institution
    Michigan State University, East Lansing, Mich.
  • Volume
    62
  • Issue
    1
  • fYear
    1974
  • Firstpage
    109
  • Lastpage
    117
  • Abstract
    The design of an efficient microwave plasma source is described. This source consists of a quartz tube surrounded by a cylindrical variable-length cavity which is connected to a 2.450-GHz power microwave source. The circuit performance of the plasma-cavity system is qualitatively explained and the lossy plasma-cavity eigenfrequencies are computed as functions of plasma density, effective collision frequency, and cavity length. Experiments demonstrate that a variable high-density plasma with densities in excess of 1000 critical densities can be sustained. Furthermore, by adjusting cavity length and coupling, microwave plasmas can be sustained in flowing and nonflowing argon gaseous environments from pressures of several microns to over one atmosphere.
  • Keywords
    Electromagnetic heating; Fault location; Microwave ovens; Plasma applications; Plasma chemistry; Plasma density; Plasma properties; Plasma sources; Plasma temperature; Plasma waves;
  • fLanguage
    English
  • Journal_Title
    Proceedings of the IEEE
  • Publisher
    ieee
  • ISSN
    0018-9219
  • Type

    jour

  • DOI
    10.1109/PROC.1974.9391
  • Filename
    1451321