Title :
Fabrication tolerance analysis of an OEIC passive duplexer
Author :
Chipouras, A. ; Papastergiou, G. ; Sphicopoulos, T.
Author_Institution :
Dept. of Inf., Athens Univ., Greece
fDate :
7/1/1993 12:00:00 AM
Abstract :
A simulation method has been developed to study the fabrication tolerances of a passive duplexer on InP substrate which could be a part of an optoelectronic integrated circuit (OEIC) module. This method, based on a Taylor´s series expansion, is fast enough to estimate the effect produced on the crossover power when a simultaneous variation of the duplexer parameters take place. It seems to be very useful, particularly during a repetitive control of the device characteristics.<>
Keywords :
approximation theory; integrated optoelectronics; optical waveguide theory; InP; OEIC passive duplexer; Taylor´s series expansion; crossover power; device characteristics; fabrication tolerances; optical workshop techniques; optoelectronic integrated circuit; repetitive control; simulation method; substrate; Etching; Indium phosphide; Informatics; Lithography; Optical device fabrication; Optical propagation; Optical waveguides; Optoelectronic devices; Polynomials; Tolerance analysis;
Journal_Title :
Photonics Technology Letters, IEEE
