DocumentCode
932457
Title
Design optimization of AlInAs-GaInAs HEMTs for high-frequency applications
Author
Lopez, Javier Mateos ; González, Tomás ; Pardo, Daniel ; Bollaert, Sylvain ; Parenty, Thierry ; Cappy, Alain
Author_Institution
Dept. de Fisica Aplicada, Univ. de Salamanca, Spain
Volume
51
Issue
4
fYear
2004
fDate
4/1/2004 12:00:00 AM
Firstpage
521
Lastpage
528
Abstract
By using a Monte Carlo simulator, the static and dynamic characteristics of 50-nm-gate AlInAs-GaInAs δ-doped high-electron mobility transistors (HEMTs) are investigated. The Monte Carlo model includes some important effects that are indispensable when trying to reproduce the real behavior of the devices, such as degeneracy, presence of surface charges, T-shape of the gate, presence of dielectrics, and contact resistances. Among the large quantity of design parameters that enter the fabrication of the devices, we have studied the influence on their performance of two important factors: the doping level of the δ-doped layer, and the width of the devices. We have confirmed that the value of the δ-doping must be increased to avoid the reduction of the drain current due to the depletion of the channel by the surface potential. However, a higher δ-doping has the drawback that the frequency performance of the HEMTs is deteriorated, and its value must be carefully chosen depending on the system requirements in terms of delivered power and frequency of operation. The reduction of the device width has been also checked to improve the cutoff frequencies of the HEMTs, with a lower limit imposed by the degradation provoked by the offset extrinsic capacitances.
Keywords
Monte Carlo methods; UHF transistors; aluminium compounds; circuit simulation; gallium compounds; high electron mobility transistors; indium compounds; semiconductor device models; AlInAs-GaInAs; HEMTs; Monte Carlo simulator; channel depletion; contact resistances; degeneracy; design optimization; dielectrics; doping; drain current; dynamic characteristics; frequency performance; gate T-shape; high-electron mobility transistors; high-frequency applications; offset extrinsic capacitances; static characteristics; surface charges; surface potential; Capacitance; Cutoff frequency; Degradation; Design optimization; Dielectric devices; Doping; Fabrication; HEMTs; MODFETs; Monte Carlo methods;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2004.823799
Filename
1275634
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