DocumentCode :
933758
Title :
A New Method to Extract Carrier Velocity in Sub-0.1- \\mu m MOSFETs Using RF Measurements
Author :
Lee, Seonghearn
Volume :
5
Issue :
3
fYear :
2006
fDate :
5/1/2006 12:00:00 AM
Firstpage :
163
Lastpage :
166
Abstract :
A novel RF method based on the accurate extraction of the gate–source channel capacitance and intrinsic transconductance from measured S -parameters is proposed to determine the effective carrier velocity of sub-0.1- \\mu m MOSFETs in the velocity saturation region. This method is developed to avoid the errors associated with underestimated charge in traditional ones. Using the RF technique, the electron velocity overshoot exceeding the bulk saturation velocity is observed along with the linear dependence of measured electron velocity on 1/L_ poly in bulk N-MOSFETs with a channel length of less than 0.085 \\mu m. This extracted result is more accurate than that of previous methods, because v_ eff is directly determined from the gate–source channel capacitance at high V  ds instead of that at V  ds=0 .
Keywords :
Carrier velocity; MOSFET; device modeling; parameter estimation; sub-0.1; CMOS technology; Capacitance measurement; Electrons; Length measurement; MOSFET circuits; Parasitic capacitance; Radio frequency; Testing; Transconductance; Velocity measurement; Carrier velocity; MOSFET; device modeling; parameter estimation; sub-0.1;
fLanguage :
English
Journal_Title :
Nanotechnology, IEEE Transactions on
Publisher :
ieee
ISSN :
1536-125X
Type :
jour
DOI :
10.1109/TNANO.2006.869944
Filename :
1632128
Link To Document :
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