DocumentCode :
933806
Title :
Design optimization of gate-all-around (GAA) MOSFETs
Author :
Song, Jae Young ; Choi, Woo Young ; Park, Ju Hee ; Lee, Jong Duk ; Park, Byung-Gook
Author_Institution :
Sch. of Electr. Eng., Inter-Univ. Semicond. Res. Center, Seoul, South Korea
Volume :
5
Issue :
3
fYear :
2006
fDate :
5/1/2006 12:00:00 AM
Firstpage :
186
Lastpage :
191
Abstract :
The design of gate-all-around (GAA) MOSFETs was optimized and compared with that of double-gate MOSFETs. We discussed the optimal ratio of the fin width to the gate length and investigated short-channel effects of GAA MOSFETs. Using three-dimensional simulations, we confirmed that short-channel effects were properly suppressed although the fin width was the same as the gate length in GAA MOSFETs. Finally, we compared cubical channel GAA MOSFETs with cylindrical-channel ones. As a result, it was observed that the latter showed the maximized ratio of the fin width to the gate length up to 1.2.
Keywords :
MOSFET; semiconductor device models; cubical channel gate-all-around MOSFETs; cylindrical-channel GAA MOSFETs; double-gate MOSFETs; fin width; gate length; short-channel effects; three-dimensional simulations; Collaborative work; Design optimization; Electrodes; MOSFETs; Shape; Silicon; Substrates; Transconductance; Cylindrical-channel MOSFETs; double-gate (DG) MOSFET; gate-all-around (GAA) MOSFET;
fLanguage :
English
Journal_Title :
Nanotechnology, IEEE Transactions on
Publisher :
ieee
ISSN :
1536-125X
Type :
jour
DOI :
10.1109/TNANO.2006.869952
Filename :
1632132
Link To Document :
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