Development of high-power OPCPA laser at 1064 and 780 nm

Author

Leng, Yuxin ; Liang, Xiaoyang ; Zhao, Baozhen ; Wang, Cheng ; Jiang, Yongliang ; Yang, Xiaodong ; Lu, Haihe ; Lin, Lihuang ; Zhang, Zhengquan ; Li, Ruxin ; Xu, Zhizhan

Author_Institution

State Key Lab. of High Field Laser Phys., Chinese Acad. of Sci., Shanghai, China

Volume

12

Issue

2

fYear

2006

Firstpage

187

Lastpage

193

Abstract

A compact 10-TW/100-fs level ultrashort-pulse and ultra-intense laser system at 1064 nm based on optical parametric chirped pulse amplification (OPCPA) scheme is described, at which the pump and seed for the optical parametric amplification (OPA) process is optically synchronized. We investigated the output stability and the conversion efficiency of the system. Moreover, a design toward higher peak power output is given and an optically synchronized amplifier based on the concept of OPCPA at 800 nm is preliminarily explored.

Keywords

chirp modulation; laser stability; optical parametric amplifiers; optical pulse generation; optical pumping; solid lasers; synchronisation; 10 TW; 100 fs; 1064 nm; 780 nm; 800 nm; OPA pump; OPA seed; OPCPA laser; chirped pulse amplification; high-power laser; optical parametric amplification; optical synchronization; output laser stability; ultraintense laser system; ultrashort-pulse laser system; Chirp; Laser excitation; Nonlinear optics; Optical design; Optical pulses; Optical pumping; Pulse amplifiers; Pump lasers; Stability; Stimulated emission; High-peak-power ultrashort-pulse laser; optical parametric chirped pulse amplification;

fLanguage

English

Journal_Title

Selected Topics in Quantum Electronics, IEEE Journal of

Publisher

ieee

ISSN

1077-260X

Type

jour

DOI

10.1109/JSTQE.2006.872060

Filename

1632164