DocumentCode :
935312
Title :
Tape automated bonding inner lead bonded devices (TAB/ILB) failure analysis
Author :
Tung, Chih-Hang ; Kuo, Yen-Shu ; Chang, Shih-Ming
Author_Institution :
Electron. Res. & Service Organ., Ind. Technol. Res. Inst., Hsinchu, Taiwan
Volume :
16
Issue :
3
fYear :
1993
fDate :
5/1/1993 12:00:00 AM
Firstpage :
304
Lastpage :
310
Abstract :
Tape automated bonding inner lead bonded (TAB/ILB) devices were stressed by environmental tests and the subsequent failure analysis was performed. Two interesting failure mechanisms were observed, one is lead beam fracture after temperature cycling. It was observed to initiate at the intermetallics formed between Cu, lead and its tin plating layer during temperature cycling. The other mechanism is diffusion penetration of Ti-W barrier alloy by Au and Al interdiffusion. The penetration reaction includes nucleation, growth, and coalescence. Al hillocks were observed to be the nucleation sites. The result of this work can be applied in modifying bumping and inner lead bonding processes
Keywords :
chemical interdiffusion; circuit reliability; environmental testing; failure analysis; tape automated bonding; Al interdiffusion; Au interdiffusion; TAB linear lead bonded devices; TiW barrier alloy; coalescence; diffusion penetration; environmental tests; failure analysis; failure mechanisms; hillocks; lead beam fracture; nucleation; temperature cycling; Aluminum; Bonding; Capacitive sensors; Electrons; Failure analysis; Gold alloys; Packaging; Performance evaluation; Temperature; Testing;
fLanguage :
English
Journal_Title :
Components, Hybrids, and Manufacturing Technology, IEEE Transactions on
Publisher :
ieee
ISSN :
0148-6411
Type :
jour
DOI :
10.1109/33.232057
Filename :
232057
Link To Document :
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