Title :
New method of registration for electron-beam lithography
Author :
Ahmed, Hameeza ; Hoare, R.D.
Author_Institution :
Cambridge University, Engineering Department, Cambridge, UK
Abstract :
A method of pattern registration for use in electron-beam lithography is described in the letter. The beam energy is reduced by a retarding field during the location of a pattern position, and the resist is unexposed. Patterns may be joined without any registration marks.
Keywords :
electron beam applications; photolithography; beam energy; electron beam lithography; pattern registration; retarding field;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19760021
