DocumentCode :
936604
Title :
New semiconductor contact technology
Author :
Sullivan, A.B.J.
Author_Institution :
Services Electronics Research Laboratory, Baldock, UK
Volume :
12
Issue :
6
fYear :
1976
Firstpage :
133
Lastpage :
134
Abstract :
Metals have been deposited on semiconductors from standard plating solutions, in defined areas which have been lightly damaged by ion bombardment. The contacts are either ohmic or rectifying, depending on bombardment dose and plating conditions. The process has been used to make gallium-arsenide f.e.t.s.
Keywords :
electrical contacts; electroplating; field effect transistors; ohmic contacts; semiconductor device manufacture; GaAs FETs; ion bombardment; ohmic contacts; selected area electroplating; semiconductor contact technology;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19760105
Filename :
4239655
Link To Document :
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