DocumentCode :
937411
Title :
Field-dependence of the area-density of ´cold´ electron emission sites on broad-area CVD diamond films
Author :
Xu, N.S. ; Latham, R.V. ; Tzeng, Ying-Shuen
Author_Institution :
Dept. of Electron. Eng. & Appl. Phys., Aston Univ., Birmingham, UK
Volume :
29
Issue :
18
fYear :
1993
Firstpage :
1596
Lastpage :
1597
Abstract :
A high area density of field-induced electron emission sites has been observed on broad-area (12 mm in diameter) CVD diamond films deposited on molybdenum substrates. Furthermore, it was found that the density increased with the electric field applied to the surface of the films. These findings indicate that the CVD diamond film has to be seen as a potentially favoured candidate among electronic materials for the development of new types of cold cathode electron source.
Keywords :
CVD coatings; diamond; electron field emission; semiconductor thin films; 12 mm; C; Mo substrate; area-density; broad-area CVD diamond films; cold electron emission sites; field-induced electron emission sites;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19931063
Filename :
233063
Link To Document :
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