• DocumentCode
    937764
  • Title

    pMOS transistors for dosimetric application

  • Author

    Ristic, G. ; Golubovic, S. ; Pejovic, M.

  • Author_Institution
    Fac. of Electron. Eng., Serbia, Yugoslavia
  • Volume
    29
  • Issue
    18
  • fYear
    1993
  • Firstpage
    1644
  • Lastpage
    1646
  • Abstract
    The dosimetric properties of Al-gate pMOS transistors for low-level dose, are investigated. A radiation environment was simulated by 60Co gamma rays. The experiments have demonstrated that pMOS transistors with a thickness of 2 mu m, irradiated to 1000 rad (Si) with 9 V on the gate, provide a good sensitivity of 20 mV/rad, as well as a stability of 4.2% after 1000 h room-temperature annealing.
  • Keywords
    dosimeters; gamma-ray effects; insulated gate field effect transistors; nuclear electronics; 1000 h; 1000 rad; 2 micron; 293 K; 60Co gamma rays; Al-SiO 2-Si; Al-gate pMOS transistors; annealing; dosimetric properties; sensitivity; stability;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19931095
  • Filename
    233095