DocumentCode :
939196
Title :
Hydrogen sensitivity of palladium--thin-oxide--silicon Schottky barriers
Author :
Shivaraman, M.S. ; Lundstr¿¿m, I. ; Svensson, Christer ; Hammarsten, H.
Author_Institution :
Chalmers University of Technology, Research Laboratory of Electronics, Gothenburg, Sweden
Volume :
12
Issue :
18
fYear :
1976
Firstpage :
483
Lastpage :
484
Abstract :
It is shown that current transport through Schottky barriers formed by Pd on n-type silicon with a thin thermally grown oxide is sensitive to hydrogen in the ambient. It is shown that a transition from minority- to majority-carrier dominated current occurs with increasing hydrogen pressure.
Keywords :
Schottky effect; metal-insulator-semiconductor structures; tunnelling; H2 sensitivity; Pd thin oxide Si Schottky barriers; majority carriers; minority carriers;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19760365
Filename :
4240040
Link To Document :
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