Superconducting Ba/sub 1-x/K/sub x/BiO/sub 3/ thin film by in-situ sputtering

Author

Hu, R. ; Lee, A.E. ; Chan, H.W. ; Pettiette-Hall, C.L.

Author_Institution

TRW Space & Technol. Group, Redondo Beach, CA, USA

Volume

3

Issue

1

fYear

1993

fDate

3/1/1993 12:00:00 AM

Firstpage

1556

Lastpage

1558

Abstract

Superconducting Ba/sub 1-x/K/sub x/BiO/sub 3/ thin films with T/sub c/ (R=0) as high as 29.2 K have been grown using off-axis RF magnetron sputtering. Films are routinely deposited with zero resistance between 25 K and 29 K. High pressure during deposition is considered to be responsible for higher-T/sub c/ films. The films grow epitaxially with

Keywords

barium compounds; high-temperature superconductors; potassium compounds; sputter deposition; superconducting epitaxial layers; superconducting transition temperature; vapour phase epitaxial growth; 25 to 29 K; 29.2 K; Ba/sub 1-x/K/sub x/BiO/sub 3/; SrTiO/sub 3/; YBa/sub 2/Cu/sub 3/O/sub 7-x/ films; epitaxial growth; high pressure; in-situ sputtering; off-axis RF magnetron sputtering; superconducting thin film; zero resistance; Barium; Critical current; Electrical resistance measurement; Immune system; Semiconductor films; Sputtering; Superconducting epitaxial layers; Superconducting films; Superconducting thin films; Superconducting transition temperature;

fLanguage

English

Journal_Title

Applied Superconductivity, IEEE Transactions on

Publisher

ieee

ISSN

1051-8223

Type

jour

DOI

10.1109/77.233368

Filename

233368