DocumentCode :
940171
Title :
Room temperature continuous-wave operation of buried ridge stripe lasers using InAs-InP (100) quantum dots as active core
Author :
Lelarge, F. ; Rousseau, B. ; Dagens, B. ; Poingt, F. ; Pommereau, F. ; Accard, A.
Author_Institution :
Alcatel-Thales III-V Lab., Marcoussis, France
Volume :
17
Issue :
7
fYear :
2005
fDate :
7/1/2005 12:00:00 AM
Firstpage :
1369
Lastpage :
1371
Abstract :
Self-organized InAs quantum-dot (QD) lasers emitting at 1.5 μm were grown by gas source molecular beam epitaxy on (100) InP substrates. Room temperature continuous-wave (CW) operation of QD-based buried ridge stripe lasers is reported. We investigated experimentally the relevant CW performances of as-cleaved InP-based QD lasers for telecom applications such as temperature properties (T0=56 K), infinite length threshold current density (J/sub /spl infin///spl sim/150 A/cm2 per QDs layer) and internal efficiency (0.37 W/A). Lasing in pulsed mode is observed for cavity length as short as 200 μm with a threshold current of about 37 mA, demonstrating the high gain of the QD´s active core. In addition, the Henry parameter of these InP-based QD lasers is experimentally determined using the Hakki-Paoli method (/spl alpha//sub H//spl sim/2.2).
Keywords :
III-V semiconductors; current density; indium compounds; laser cavity resonators; laser modes; molecular beam epitaxial growth; quantum dot lasers; semiconductor epitaxial layers; semiconductor growth; 1.5 mum; 200 mum; 293 to 298 K; 37 mA; 56 K; Hakki-Paoli method; Henry parameter; InAs-InP; InAs-InP (100) quantum dots; InP; InP substrate; active core gain; as-cleaved QD lasers; buried ridge stripe laser; continuous-wave laser operation; current density; gas source molecular beam epitaxy; internal laser efficiency; laser cavity; pulsed mode lasing; quantum dot active core; room temperature laser operation; self-organized quantum dot lasers; telecom applications; temperature properties; Gas lasers; Indium phosphide; Laser applications; Laser modes; Molecular beam epitaxial growth; Quantum dot lasers; Quantum dots; Substrates; Temperature; Threshold current; Gas source molecular beam epitaxy (GSMBE); InGaAsP–InP quantum-dot (QD) lasers; semiconducting III–V materials;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/LPT.2005.848279
Filename :
1453613
Link To Document :
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