Electrical subharmonic hybrid mode locking of a colliding pulse mode-locked laser at 28 GHz

Author

Ji, C. ; Chubun, N. ; Broeke, R.G. ; Cao, J. ; Du, Y. ; Bjeletich, P. ; Yoo, S.J.B.

Author_Institution

Electr. & Comput. Eng. Dept., Univ. of California, Davis, CA, USA

Volume

17

Issue

7

fYear

2005

fDate

7/1/2005 12:00:00 AM

Firstpage

1381

Lastpage

1383

Abstract

This letter discusses electrical subharmonic hybrid mode locking (SHML) of a colliding pulse mode-locked (CPM) laser in InP. The CPM laser fabrication adopts a simple wet etching process and bisbenzocyclobutene planarization process for realizing planarized low-capacitance devices. The experimental results show, for the first time to our knowledge, stable emission of nearly transform-limited pulses at 28 GHz of a CPM laser synchronized to a clock source by SHML. We further describe careful optimization steps of dc and radio-frequency biasing conditions which lead to minimal output pulsewidth of 1.4 ps, limited by the saturable absorber dimension.

Keywords

III-V semiconductors; etching; indium compounds; laser mode locking; optical pulse generation; optical saturable absorption; optimisation; organic compounds; planarisation; quantum well lasers; semiconductor epitaxial layers; synchronisation; 28 GHz; InP; bisbenzocyclobutene planarization; clock source; colliding pulse laser; dc biasing; electrical mode locking; hybrid mode locking; laser fabrication; laser synchronization; low-capacitance devices; mode-locked laser; optimization steps; radiofrequency biasing; saturable absorber; subharmonic mode locking; transform-limited pulses; wet etching; Clocks; Indium phosphide; Laser mode locking; Laser stability; Optical device fabrication; Optical pulses; Planarization; Radio frequency; Synchronization; Wet etching; Clock synchronization; colliding pulse mode-locked (CPM) laser; radio-frequency (RF) modulation; subharmonic hybrid mode locking (SHML); transform-limited pulse;

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/LPT.2005.848555

Filename

1453617