DocumentCode :
940428
Title :
Fabrication method for passive alignment in polymer PLCs with U-grooves
Author :
Park, S. ; Jong-Moo Lee ; Sang Choon Ko
Author_Institution :
Basic Res. Lab., Electron. & Telecommun. Res. Inst., Daejon, South Korea
Volume :
17
Issue :
7
fYear :
2005
fDate :
7/1/2005 12:00:00 AM
Firstpage :
1444
Lastpage :
1446
Abstract :
A method is developed to enhance fabrication tolerance for the passive alignment of polymer waveguides to optical fibers in polymer-based planar lightwave circuit (PLC) devices. For the passive alignment, the waveguides and U-grooves, into which the optical fibers are set, are fabricated on a substrate. In order to eliminate lateral misalignment between the centers of the waveguides and U-grooves due to the steps of photolithography, an optical axis alignment is achieved in one photomask. Reduced-cladding single-mode fibers with an 80-μm diameter are used to reduce vertical misalignment. PLCs based on polymers were implemented on a 4-in Si wafer using the method, and excessive losses of less than 0.4 dB were obtained.
Keywords :
integrated optics; masks; optical fabrication; optical fibre losses; optical polymers; optical waveguides; photolithography; 4 in; 80 mum; Si wafer; U-grooves; fabrication tolerance; optical axis alignment; optical fabrication; optical fibers; passive alignment; photolithography; photomask; planar lightwave circuit devices; polymer PLC; polymer waveguides; reduced-cladding fibers; single-mode fibers; Circuits; Lithography; Optical device fabrication; Optical fibers; Optical losses; Optical planar waveguides; Optical polymers; Optical waveguides; Planar waveguides; Programmable control; Optical platform; passive alignment; polymer optical module; polymer planar lightwave circuit (PLC);
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/LPT.2005.848287
Filename :
1453638
Link To Document :
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