Processing, characterization, and potential applications of YBa/sub 2/Cu/sub 3/O/sub 7//Au and YBa/sub 2/Cu/sub 3/O/sub 7//Au/Si superconducting thin films fabricated by rapid isothermal processing assisted metalorganic chemical vapor deposition

Author

Singh, R. ; Ng, J.T.C. ; Singh, R.K. ; Qian, F. ; Hsu, N.J. ; Krueger, D.J.

Author_Institution

Dept. of Electr. & Comput. Eng., Clemson Univ., SC, USA

Volume

3

Issue

1

fYear

1993

fDate

3/1/1993 12:00:00 AM

Firstpage

1

Lastpage

7

Abstract

Rapid-isothermal processing (RIP)-assisted metalorganic chemical vapor deposition (MOCVD) has been used for the deposition of high-quality films of YBa/sub 2/Cu/sub 3/O/sub 7/ (YBCO) on insulating substrates at temperatures as low as 610 degrees C. The results of processing and characterization of YBCO films deposited on bulk gold foils and Au/Si substrates by RIP-assisted MOCVD are reported. By the use of YBCO/Au foils, improvement in the performance of Au/YBCO/n-Si Schottky diodes operating at 50 K is achieved.<>

Keywords

Schottky-barrier diodes; barium compounds; chemical vapour deposition; gold; high-temperature superconductors; rapid thermal processing; silicon; superconducting junction devices; superconducting thin films; yttrium compounds; 50 K; Au; MOCVD; Schottky diodes; Si; YBa/sub 2/Cu/sub 3/O/sub 7/-Au; YBa/sub 2/Cu/sub 3/O/sub 7/-Au-Si; characterization; high temperature superconductors; insulating substrates; performance; potential applications; processing; rapid isothermal processing assisted metalorganic chemical vapor deposition; superconducting thin films; Chemical vapor deposition; Dielectric substrates; Gold; High temperature superconductors; Isothermal processes; MOCVD; Plasma temperature; Superconducting films; Superconducting thin films; Yttrium barium copper oxide;

fLanguage

English

Journal_Title

Applied Superconductivity, IEEE Transactions on

Publisher

ieee

ISSN

1051-8223

Type

jour

DOI

10.1109/77.233414

Filename

233414