DocumentCode
941044
Title
Interface-recombination-controlled minority-carrier lifetime in n-type gap
Author
Blenkinsop, J.D. ; Harding, W.R. ; Wight, D.R.
Author_Institution
Royal Signals & Radar Establishment, Baldock, UK
Volume
13
Issue
1
fYear
1977
Firstpage
14
Lastpage
16
Abstract
The effects of interface recombination on measured minority-carrier lifetime in n-type liquid-phase epitaxial GaP layers have been studied quantitatively. Results are presented for a number of different interface conditions, and analysis shows that the interface recombination velocity is high in all cases. This results in a unique dependence of interface-recombination-controlled lifetime ¿s, on layer thickness t for all values of t > ~0.5 ¿m. In most layers, the value of ¿s is low enough to influence the measured lifetime. A value for the minority hole diffusion coefficient, Dh = 4.0±0.3 cm2 s¿1, is also deduced from the ¿s data.
Keywords
III-V semiconductors; carrier lifetime; electron-hole recombination; gallium compounds; minority carriers; semiconductor epitaxial layers; interface recombination controlled minority carrier lifetime; interface recombination velocity; liquid phase epitaxial layers; minority hole diffusion coefficient; n-GaP; semiconductor;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19770011
Filename
4240334
Link To Document