DocumentCode :
941044
Title :
Interface-recombination-controlled minority-carrier lifetime in n-type gap
Author :
Blenkinsop, J.D. ; Harding, W.R. ; Wight, D.R.
Author_Institution :
Royal Signals & Radar Establishment, Baldock, UK
Volume :
13
Issue :
1
fYear :
1977
Firstpage :
14
Lastpage :
16
Abstract :
The effects of interface recombination on measured minority-carrier lifetime in n-type liquid-phase epitaxial GaP layers have been studied quantitatively. Results are presented for a number of different interface conditions, and analysis shows that the interface recombination velocity is high in all cases. This results in a unique dependence of interface-recombination-controlled lifetime ¿s, on layer thickness t for all values of t > ~0.5 ¿m. In most layers, the value of ¿s is low enough to influence the measured lifetime. A value for the minority hole diffusion coefficient, Dh = 4.0±0.3 cm2 s¿1, is also deduced from the ¿s data.
Keywords :
III-V semiconductors; carrier lifetime; electron-hole recombination; gallium compounds; minority carriers; semiconductor epitaxial layers; interface recombination controlled minority carrier lifetime; interface recombination velocity; liquid phase epitaxial layers; minority hole diffusion coefficient; n-GaP; semiconductor;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19770011
Filename :
4240334
Link To Document :
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