• DocumentCode
    941044
  • Title

    Interface-recombination-controlled minority-carrier lifetime in n-type gap

  • Author

    Blenkinsop, J.D. ; Harding, W.R. ; Wight, D.R.

  • Author_Institution
    Royal Signals & Radar Establishment, Baldock, UK
  • Volume
    13
  • Issue
    1
  • fYear
    1977
  • Firstpage
    14
  • Lastpage
    16
  • Abstract
    The effects of interface recombination on measured minority-carrier lifetime in n-type liquid-phase epitaxial GaP layers have been studied quantitatively. Results are presented for a number of different interface conditions, and analysis shows that the interface recombination velocity is high in all cases. This results in a unique dependence of interface-recombination-controlled lifetime ¿s, on layer thickness t for all values of t > ~0.5 ¿m. In most layers, the value of ¿s is low enough to influence the measured lifetime. A value for the minority hole diffusion coefficient, Dh = 4.0±0.3 cm2 s¿1, is also deduced from the ¿s data.
  • Keywords
    III-V semiconductors; carrier lifetime; electron-hole recombination; gallium compounds; minority carriers; semiconductor epitaxial layers; interface recombination controlled minority carrier lifetime; interface recombination velocity; liquid phase epitaxial layers; minority hole diffusion coefficient; n-GaP; semiconductor;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19770011
  • Filename
    4240334