• DocumentCode
    942017
  • Title

    Design and Process Sensitivity of a Two-Stage 6 - 18-GHz Monolithic Feedback Amplifier

  • Author

    Beall, J.M. ; Nelson, S.R. ; Williams, R.E.

  • Volume
    33
  • Issue
    12
  • fYear
    1985
  • Firstpage
    1566
  • Lastpage
    1571
  • Abstract
    The design of a 6-18-GHz two-stage monolithic feedback amplifier is discussed, and the critical process and FET parameters are identified. Variations in circuit performance experienced during a pilot production run are correlated with the predictions of a sensitivity analysis. Five circuit model parameters were selected for study substrate height, GaAs sheet resistance, gate-source capacitance, transconductance, and drain-source resistance. Measured results show the importance of substrate height and sheet resistance in the control of gain flatness. An example on-slice RF performance distribution is presented, showing the suitability of the circuit and fabrication process for high-volume production.
  • Keywords
    Capacitance; Circuit optimization; Electrical resistance measurement; FETs; Feedback amplifiers; Gallium arsenide; Process design; Production; Sensitivity analysis; Transconductance;
  • fLanguage
    English
  • Journal_Title
    Microwave Theory and Techniques, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9480
  • Type

    jour

  • DOI
    10.1109/TMTT.1985.1133258
  • Filename
    1133258