DocumentCode :
942017
Title :
Design and Process Sensitivity of a Two-Stage 6 - 18-GHz Monolithic Feedback Amplifier
Author :
Beall, J.M. ; Nelson, S.R. ; Williams, R.E.
Volume :
33
Issue :
12
fYear :
1985
Firstpage :
1566
Lastpage :
1571
Abstract :
The design of a 6-18-GHz two-stage monolithic feedback amplifier is discussed, and the critical process and FET parameters are identified. Variations in circuit performance experienced during a pilot production run are correlated with the predictions of a sensitivity analysis. Five circuit model parameters were selected for study substrate height, GaAs sheet resistance, gate-source capacitance, transconductance, and drain-source resistance. Measured results show the importance of substrate height and sheet resistance in the control of gain flatness. An example on-slice RF performance distribution is presented, showing the suitability of the circuit and fabrication process for high-volume production.
Keywords :
Capacitance; Circuit optimization; Electrical resistance measurement; FETs; Feedback amplifiers; Gallium arsenide; Process design; Production; Sensitivity analysis; Transconductance;
fLanguage :
English
Journal_Title :
Microwave Theory and Techniques, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9480
Type :
jour
DOI :
10.1109/TMTT.1985.1133258
Filename :
1133258
Link To Document :
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