Measurement of conduction properties of highly resistive superconducting microbridges

Author

Chen, X. ; Yoshikawa, N. ; Sugahara, M.

Author_Institution

Fac. of Eng., Yokohama Nat. Univ., Japan

Volume

3

Issue

1

fYear

1993

fDate

3/1/1993 12:00:00 AM

Firstpage

1991

Lastpage

1994

Abstract

The authors present experimental results on the properties of very small microbridges with high junction resistance. The authors fabricated NbN microbridges with very narrow width (<100 nm) and length ( approximately 100 nm) by electron beam lithography, and measured the junction properties, such as I-V characteristics and temperature dependence. The junctions with very high resistance (>>k Omega ) exhibit unusual nonlinearity in the I-V relation, which is dual to the Josephson characteristics. The electric field effect in a two-junction array is also examined, where a gate electric field is applied to a center electrode. Experimental results agree fairly well with numerical calculations, assuming that the bridge consists of a one-dimensional array of the single-electron-tunnel junction.<>

Keywords

Josephson effect; electron beam lithography; niobium compounds; superconducting junction devices; superconductive tunnelling; type II superconductors; 100 nm; I-V characteristics; Josephson characteristics; NbN microbridges; conduction properties; electric field effect; electron beam lithography; gate electric field; high junction resistance; highly resistive superconducting microbridges; junction properties; one-dimensional array; single-electron-tunnel junction; temperature dependence; two-junction array; Bridge circuits; Electrical resistance measurement; Electrodes; Electrons; Josephson effect; Josephson junctions; Lithography; Quantum mechanics; Substrates; Tunneling;

fLanguage

English

Journal_Title

Applied Superconductivity, IEEE Transactions on

Publisher

ieee

ISSN

1051-8223

Type

jour

DOI

10.1109/77.233567

Filename

233567