• DocumentCode
    942667
  • Title

    Optical silicon lifetime measurements in heavily doped diffused regions

  • Author

    Chamberlain, S.C. ; Roulston, D.J. ; Desai, S.P.

  • Author_Institution
    University of Waterloo, Electrical Engineering Department, Waterloo, Canada
  • Volume
    13
  • Issue
    18
  • fYear
    1977
  • Firstpage
    544
  • Lastpage
    545
  • Abstract
    Monochromatic visible light at various wavelengths was used to generate photocurrent in a silicon n+-p diffused diode. A numerical model which includes electric field, heavy doping band gap reduction and doping level mobility dependence was used with fitting techniques to determine the carrier lifetime in the n+-region at each wavelength.
  • Keywords
    carrier lifetime; elemental semiconductors; p-n homojunctions; photodiodes; silicon; doping level mobility dependence; heavily doped diffused regions; heavy doping band gap reduction; n+-p diffused diode; n+-region; numerical model; optical Si lifetime measurements; photocurrent; photodiode;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19770391
  • Filename
    4240522