DocumentCode :
942667
Title :
Optical silicon lifetime measurements in heavily doped diffused regions
Author :
Chamberlain, S.C. ; Roulston, D.J. ; Desai, S.P.
Author_Institution :
University of Waterloo, Electrical Engineering Department, Waterloo, Canada
Volume :
13
Issue :
18
fYear :
1977
Firstpage :
544
Lastpage :
545
Abstract :
Monochromatic visible light at various wavelengths was used to generate photocurrent in a silicon n+-p diffused diode. A numerical model which includes electric field, heavy doping band gap reduction and doping level mobility dependence was used with fitting techniques to determine the carrier lifetime in the n+-region at each wavelength.
Keywords :
carrier lifetime; elemental semiconductors; p-n homojunctions; photodiodes; silicon; doping level mobility dependence; heavily doped diffused regions; heavy doping band gap reduction; n+-p diffused diode; n+-region; numerical model; optical Si lifetime measurements; photocurrent; photodiode;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19770391
Filename :
4240522
Link To Document :
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