DocumentCode
942667
Title
Optical silicon lifetime measurements in heavily doped diffused regions
Author
Chamberlain, S.C. ; Roulston, D.J. ; Desai, S.P.
Author_Institution
University of Waterloo, Electrical Engineering Department, Waterloo, Canada
Volume
13
Issue
18
fYear
1977
Firstpage
544
Lastpage
545
Abstract
Monochromatic visible light at various wavelengths was used to generate photocurrent in a silicon n+-p diffused diode. A numerical model which includes electric field, heavy doping band gap reduction and doping level mobility dependence was used with fitting techniques to determine the carrier lifetime in the n+-region at each wavelength.
Keywords
carrier lifetime; elemental semiconductors; p-n homojunctions; photodiodes; silicon; doping level mobility dependence; heavily doped diffused regions; heavy doping band gap reduction; n+-p diffused diode; n+-region; numerical model; optical Si lifetime measurements; photocurrent; photodiode;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19770391
Filename
4240522
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