DocumentCode
943249
Title
Effect of the reverse bias between channel and substrate on the effective mobility of electrons in a Ge i.g.f.e.t.
Author
Kvon Ze Don ; Neizvestny, G. ; Ovsuyk, V.N.
Author_Institution
Academy of Sciences of the USSR, Siberian Branch, Institute of Semiconductor Physics, Novosibirsk, USSR
Volume
13
Issue
20
fYear
1977
Firstpage
624
Lastpage
626
Abstract
An analysis of the behaviour of the electron effective mobility under reverse bias between the channel and substrate in a germanium i.g.f.e.t. is presented. It is shown that the experimentally observed decrease in the effective mobility of the electrons in the channel is mainly caused by the decrease in the electron drift mobility in the channel, rather than by surface-state capture.
Keywords
carrier mobility; germanium; insulated gate field effect transistors; Ge IGFET; channel; electron drift mobility; electron effective mobility; insulated gate field effect transistor; reverse bias;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19770447
Filename
4240590
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