• DocumentCode
    943249
  • Title

    Effect of the reverse bias between channel and substrate on the effective mobility of electrons in a Ge i.g.f.e.t.

  • Author

    Kvon Ze Don ; Neizvestny, G. ; Ovsuyk, V.N.

  • Author_Institution
    Academy of Sciences of the USSR, Siberian Branch, Institute of Semiconductor Physics, Novosibirsk, USSR
  • Volume
    13
  • Issue
    20
  • fYear
    1977
  • Firstpage
    624
  • Lastpage
    626
  • Abstract
    An analysis of the behaviour of the electron effective mobility under reverse bias between the channel and substrate in a germanium i.g.f.e.t. is presented. It is shown that the experimentally observed decrease in the effective mobility of the electrons in the channel is mainly caused by the decrease in the electron drift mobility in the channel, rather than by surface-state capture.
  • Keywords
    carrier mobility; germanium; insulated gate field effect transistors; Ge IGFET; channel; electron drift mobility; electron effective mobility; insulated gate field effect transistor; reverse bias;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19770447
  • Filename
    4240590