DocumentCode :
943324
Title :
A New Current-Sweep Method for Assessing the Mixed-Mode Damage Spectrum of SiGe HBTs
Author :
Cheng, Peng ; Zhu, Chendong ; Appaswamy, Aravind ; Cressler, John D.
Author_Institution :
Georgia Inst. of Technol., Atlanta
Volume :
7
Issue :
3
fYear :
2007
Firstpage :
479
Lastpage :
487
Abstract :
We present a new ldquocurrent-sweeprdquo stress methodology for quantitatively assessing the mixed-mode reliability (simultaneous application of high current and high voltage) of advanced silicon-germanium (SiGe) HBTs. This electrical-stress methodology allows one to quickly obtain the complete ldquodamage spectrumrdquo of a given device from a particular technology platform, enabling better understanding of the complex voltage, current, and temperature interdependence associated with electrical stress and burn-in of advanced transistors. We consistently observe three distinct regions of mixed-mode damage in SiGe HBTs and find that hot-carrier-induced damage can be introduced into SiGe HBTs under surprisingly modest mixed-mode-stress conditions. For more aggressively scaled technology generations, a larger percentage of hot carriers generated in the collector-base junction are able to travel to and hence damage the emitter-base (EB) spacer, leading to enhanced forward-mode base-current leakage under stress. A new self-heating-induced mixed-mode-annealing effect is observed for the first time under specific high-voltage- and high-current-stress conditions, and a new damage mechanism is observed under very high-voltage and high-current conditions. Finally, as an example of the utility of our stress methodology, we quantify the composite mixed-mode damage spectrum of a commercial third-generation (200 GHz) SiGe HBT. We find that if devices are stressed with either voltage or current alone during burn-in, they can easily withstand extreme overstress conditions. Unfortunately, devices can easily be damaged when stressed with a combination of stress voltage and current, and this has significant implications for the lifetime prediction under realistic mixed-signal-circuit operating conditions.
Keywords :
Ge-Si alloys; heterojunction bipolar transistors; semiconductor device reliability; semiconductor device testing; HBT; SiGe - Interface; current-sweep method; current-sweep stress methodology; forward-mode base-current leakage; heterojunction bipolar transistor; hot-carrier-induced damage; lifetime prediction; mixed-mode damage spectrum; mixed-mode electrical stress; mixed-mode reliability; mixed-mode-annealing effect; mixed-signal-circuit operation; HBTs; Heterojunction bipolar transistors (HBTs); SiGe; SiGe HBT; heterojunction bipolar transistors; lifetime; mixed-mode electrical stress; reliability; silicon–germanium (SiGe); silicon-germanium;
fLanguage :
English
Journal_Title :
Device and Materials Reliability, IEEE Transactions on
Publisher :
ieee
ISSN :
1530-4388
Type :
jour
DOI :
10.1109/TDMR.2007.907410
Filename :
4358692
Link To Document :
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