DocumentCode :
943562
Title :
Micromechanical Velcro
Author :
Han, Hongtao ; Weiss, L.E. ; Reed, Michael L.
Author_Institution :
Carnegie Mellon Univ., Pittsburgh, PA, USA
Volume :
1
Issue :
1
fYear :
1992
fDate :
3/1/1992 12:00:00 AM
Firstpage :
37
Lastpage :
43
Abstract :
The authors have developed arrays of micromechanical mating structures, fabricated with silicon micromachining techniques, which act as mechanical adhesives. The microstructures are fabricated on standard silicon wafers, with an areal density of approximately 200000 per cm2. The microstructures on two identical surfaces will self-align and interlock with each other under application of adequate external pressure. A tensile strength per unit interlocked area of 1.1 MPa, or 160 psi, has been achieved. In this work, the authors describe the design and fabrication of this micromechanical Velcro; the authors also present results of their experimental tests, a theoretical estimate of the tensile strength, and design constraints
Keywords :
elemental semiconductors; etching; joining processes; micromechanical devices; packaging; semiconductor technology; silicon; Si micromachining techniques; areal density; design; design constraints; design rules; experimental tests; external pressure; fabrication; identical surfaces; interlock; mechanical adhesives; micromechanical Velcro; micromechanical mating structures; permanent bond; self-align; tensile strength; Bonding; Etching; Fabrication; Micromachining; Micromechanical devices; Microstructure; Silicon; Springs; Substrates; Testing;
fLanguage :
English
Journal_Title :
Microelectromechanical Systems, Journal of
Publisher :
ieee
ISSN :
1057-7157
Type :
jour
DOI :
10.1109/84.128054
Filename :
128054
Link To Document :
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