• DocumentCode
    943599
  • Title

    Two-dimensional analysis of ion-implanted, bipolar-compatible, long- and short-channel junction field-effect transistors

  • Author

    Wong, Waisum W. ; Liou, Juin J.

  • Author_Institution
    Dept. of Electr. Eng., Univ. of Central Florida, Orlando, FL, USA
  • Volume
    39
  • Issue
    11
  • fYear
    1992
  • fDate
    11/1/1992 12:00:00 AM
  • Firstpage
    2576
  • Lastpage
    2583
  • Abstract
    A two-dimensional analysis of ion-implanted, bipolar-compatible, long- and short-channel JFETs is presented. The two-dimensional device simulator PISCES is used to study the steady-state characteristics. The linear and saturation regions are analyzed, and insight about the transition region between them is obtained. Short-channel JFET behavior deviates considerably from the conventional theory developed based on the gradual channel approximation, because the x-direction electric field in the channel of the short-channel JFET is much stronger than that in the long-channel JFET. The study shows that the short-channel JFET has several properties that were not previously emphasized: (a) no pinch-off in saturation operation: (b) free-carrier drift velocity saturates in saturation operation: and (c) power-law I-V characteristics in the cutoff region. Details regarding the shape of the conducting channel, the electric field vectors, the current vectors, and the current-voltage characteristics are provided
  • Keywords
    digital simulation; ion implantation; junction gate field effect transistors; semiconductor device models; PISCES; bipolar-compatible; conducting channel shape; current vectors; current-voltage characteristics; cutoff region; electric field vectors; free-carrier drift velocity; linear region; long-channel JFET; power-law I-V characteristics; saturation operation; saturation regions; short channel effects; short-channel JFETs; steady-state characteristics; transition region; two-dimensional analysis; two-dimensional device simulator; Analytical models; Charge carrier processes; Current-voltage characteristics; Electron mobility; FETs; Failure analysis; Helium; Poisson equations; Shape; Steady-state;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.163466
  • Filename
    163466