DocumentCode
944110
Title
Normally-off Al0.5Ga0.5As heterojunction-gate GaAs f.e.t.
Author
Morkoc, H. ; Bandy, S.G. ; Antypas, G.A. ; Sankaran, Ravi
Author_Institution
Varian Associates Inc., Corporate Solid State Laboratory, Palo Alto, USA
Volume
13
Issue
24
fYear
1977
Firstpage
747
Lastpage
748
Abstract
D.C. microwave and large-signal switching properties of a normally-off heterojunction-gate GaAs f.e.t. are reported. The device structure comprises an n-type active channel layer, a p-type Al0.5Ga0.5 As gate layer and a p+-type GaAs contact layer. The gate structure is obtained by selectively etching the p-type GaAs and Al0.5Ga0.5As. Undercutting of the Al0.5Ga0.5 As layer results in a submicrometre gate length, and the resulting p+-GaAs overhang is used to self align the source and the drain with respect to the gate. GaAs f.e.t.s with 0.5 to 0.7¿-long heterojunction gates have exhibited maximum available power gains of about 9 dB at 2 GHz. Large-signal pulse measurements indicate an intrinsic propagation delay of 40 ps with an arbitrarily chosen 100¿ drain load resistance in a 50¿ microstrip circuit.
Keywords
junction gate field effect transistors; JFET; intrinsic propagation delay; normally off Al0.5Ga0.5As heterojunction gate GaAs FET; pulse measurements; submicrometre gate length; switching properties;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19770527
Filename
4240677
Link To Document