DocumentCode :
944110
Title :
Normally-off Al0.5Ga0.5As heterojunction-gate GaAs f.e.t.
Author :
Morkoc, H. ; Bandy, S.G. ; Antypas, G.A. ; Sankaran, Ravi
Author_Institution :
Varian Associates Inc., Corporate Solid State Laboratory, Palo Alto, USA
Volume :
13
Issue :
24
fYear :
1977
Firstpage :
747
Lastpage :
748
Abstract :
D.C. microwave and large-signal switching properties of a normally-off heterojunction-gate GaAs f.e.t. are reported. The device structure comprises an n-type active channel layer, a p-type Al0.5Ga0.5 As gate layer and a p+-type GaAs contact layer. The gate structure is obtained by selectively etching the p-type GaAs and Al0.5Ga0.5As. Undercutting of the Al0.5Ga0.5 As layer results in a submicrometre gate length, and the resulting p+-GaAs overhang is used to self align the source and the drain with respect to the gate. GaAs f.e.t.s with 0.5 to 0.7¿-long heterojunction gates have exhibited maximum available power gains of about 9 dB at 2 GHz. Large-signal pulse measurements indicate an intrinsic propagation delay of 40 ps with an arbitrarily chosen 100¿ drain load resistance in a 50¿ microstrip circuit.
Keywords :
junction gate field effect transistors; JFET; intrinsic propagation delay; normally off Al0.5Ga0.5As heterojunction gate GaAs FET; pulse measurements; submicrometre gate length; switching properties;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19770527
Filename :
4240677
Link To Document :
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