DocumentCode :
945723
Title :
Combination of YBa/sub 2/Cu/sub 3/O/sub 7- delta / with semiconducting substrates
Author :
Prusseit, W. ; Corsepius, S. ; Utz, B. ; Baudenbacher, F. ; Hirata, K. ; Berberich, P. ; Kinder, H. ; Eibl, O.
Author_Institution :
Dept. of Phys., Tech. Univ. Munchen, Garching, Germany
Volume :
3
Issue :
1
fYear :
1993
fDate :
3/1/1993 12:00:00 AM
Firstpage :
1070
Lastpage :
1073
Abstract :
Epitaxial YBa/sub 2/Cu/sub 3/O/sub 7- delta / films were grown on silicon and gallium arsenide substrates. The common problem of strong interdiffusion at the elevated deposition temperatures was solved by employing appropriate buffer layers. The large differential thermal expansion between silicon and YBa/sub 2/Cu/sub 3/O/sub 7- delta /, which can lead to a fracture of thicker films, was addressed by improving the fracture toughness of the films. Arsenic contamination of films on GaAs, originating from the sides and the back of the wafer, was completely solved by a proper encapsulation, yielding YBa/sub 2/Cu/sub 3/O/sub 7- delta / films comparable to those on standard substrates.<>
Keywords :
barium compounds; chemical interdiffusion; fracture toughness; high-temperature superconductors; superconducting epitaxial layers; thermal expansion; vapour phase epitaxial growth; yttrium compounds; GaAs; Si; YBa/sub 2/Cu/sub 3/O/sub 7- delta /; buffer layers; differential thermal expansion; elevated deposition temperatures; encapsulation; epitaxial layers; fracture; fracture toughness; high temperature superconductors; interdiffusion; semiconducting substrates; Buffer layers; Gallium arsenide; Semiconductivity; Semiconductor films; Silicon; Substrates; Superconducting films; Temperature; Thermal expansion; Thermal stresses;
fLanguage :
English
Journal_Title :
Applied Superconductivity, IEEE Transactions on
Publisher :
ieee
ISSN :
1051-8223
Type :
jour
DOI :
10.1109/77.233886
Filename :
233886
Link To Document :
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