Title :
Preparation and properties of Nb/Al-AlO/sub x//Nb multilayers
Author :
Kohlstedt, H. ; Hallmanns, G. ; Nevirkovets, I.P. ; Guggi, D. ; Heiden, C.
Author_Institution :
Inst. fur Schicht- und Ionentechnik, Julich, Germany
fDate :
3/1/1993 12:00:00 AM
Abstract :
The authors have deposited Nb/Al-AlO/sub x//Nb multilayers on Si substrates by DC and RF magnetron sputtering. To assist the fabrication of stacked tunnel junctions they investigated the layers by transmission electron microscopy and anodization spectroscopy. The accumulated internal mechanical stress in the niobium films depends on the argon sputtering pressure and was analyzed by the X-ray stress evaluation method. Up to ten junctions in one stack were prepared. Performance of the junctions is discussed on basis of I-V characteristics and Fraunhofer patterns.<>
Keywords :
aluminium; aluminium compounds; anodisation; internal stresses; niobium; sputter deposition; sputtered coatings; superconducting junction devices; superconducting thin films; transmission electron microscope examination of materials; type II superconductors; Fraunhofer patterns; I-V characteristics; Nb-Al-AlO/sub x/-Nb multilayers; accumulated internal mechanical stress; anodization spectroscopy; fabrication; magnetron sputtering; stacked tunnel junctions; superconducting junctions; transmission electron microscopy; Argon; Fabrication; Magnetic analysis; Magnetic multilayers; Niobium; Radio frequency; Spectroscopy; Sputtering; Stress; Transmission electron microscopy;
Journal_Title :
Applied Superconductivity, IEEE Transactions on
