• DocumentCode
    947158
  • Title

    Line width control in electron-beam lithography

  • Author

    Phang, J.C.H. ; Ahmed, Hameeza

  • Author_Institution
    Cambridge University, Engineering Department, Cambridge, UK
  • Volume
    14
  • Issue
    12
  • fYear
    1978
  • Firstpage
    382
  • Lastpage
    384
  • Abstract
    A method for predicting line widths in electron beam lithography is described. Computer predictions of line dimension as a function of dose, and profile as a function of proximity to another line are compared with experimental results on 0.35¿m thick PMMA at a beam energy of 15 keV.
  • Keywords
    electron resists; integrated circuit technology; 15 keV beam energy; PMMA; electron beam lithography; line width control;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19780258
  • Filename
    4242239
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=947158