DocumentCode :
947240
Title :
Damage-less dry etching of YBaCuO films under liquid nitrogen cooling (striplines)
Author :
Akoh, H. ; Sato, H. ; Takada, S.
Author_Institution :
Electrotechnical Lab., Ibaraki, Japan
Volume :
3
Issue :
1
fYear :
1993
fDate :
3/1/1993 12:00:00 AM
Firstpage :
2990
Lastpage :
2993
Abstract :
A novel dry etching process has been developed to reduce etching damage for striplines of YBaCuO thin films in which samples are cooled by liquid nitrogen. The patterned striplines have widths ranging from 2 to 100 mu m and a length of 1 mm. The critical current density J/sub c/ at 77 K for striplines of
Keywords :
barium compounds; critical current density (superconductivity); high-temperature superconductors; sputter etching; strip lines; superconducting microwave devices; superconducting thin films; yttrium compounds; 77 K; HTSC; YBaCuO thin films; critical current density; damage-less etching; dry etching process; liquid N/sub 2/ cooling; striplines; Anisotropic magnetoresistance; Cooling; Critical current density; Dry etching; Ion beams; Nitrogen; Sputter etching; Stripline; Superconducting films; Yttrium barium copper oxide;
fLanguage :
English
Journal_Title :
Applied Superconductivity, IEEE Transactions on
Publisher :
ieee
ISSN :
1051-8223
Type :
jour
DOI :
10.1109/77.234026
Filename :
234026
Link To Document :
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