Critical currents in submicron YBa/sub 2/Cu/sub 3/O/sub 7/ lines

Author

Assink, H. ; Harg, A.J.M. ; Schep, C.M. ; Chen, N.Y. ; Marel, D. ; Hadley, P. ; Drift, E.W.J.M. ; Mooij, J.E.

Author_Institution

Fac. of Appl. Phys., Delft Univ., Netherlands

Volume

3

Issue

1

fYear

1993

fDate

3/1/1993 12:00:00 AM

Firstpage

2983

Lastpage

2985

Abstract

Lines in YBa/sub 2/Cu/sub 3/O/sub 7/ with widths down to 200 nm and properties comparable with the original film have been defined using electron beam lithography and plasma etching. One predicted property of lines smaller than the magnetic penetration depth is an increase in the critical current density due to pinning of the vortices at the edge of the sample. There have been several reports of experimental observation of edge pinning in narrow YBa/sub 2/Cu/sub 3/O/sub 7/ lines. The authors present systematic measurements of narrow lines that should be far into the edge pinning regime, but no increase of critical current density is observed in the smallest lines.<>

Keywords

barium compounds; critical current density (superconductivity); electron beam lithography; flux pinning; high-temperature superconductors; sputter etching; superconducting integrated circuits; superconducting thin films; yttrium compounds; HTSC; critical current density; edge pinning regime; electron beam lithography; linewidth dependence; narrow lines; pinning of vortices; plasma etching; submicron YBa/sub 2/Cu/sub 3/O/sub 7/ lines; Critical current; Critical current density; Electron beams; Etching; Lithography; Magnetic films; Magnetic properties; Plasma applications; Plasma density; Plasma properties;

fLanguage

English

Journal_Title

Applied Superconductivity, IEEE Transactions on

Publisher

ieee

ISSN

1051-8223

Type

jour

DOI

10.1109/77.234030

Filename

234030