DocumentCode :
947437
Title :
Improved structure for optimisation of focus and exposure for IC production
Author :
Walton, A.J. ; Fallon, M. ; Stevenson, J.T.M. ; Ross, A.W.S. ; Reeves, C.M.
Author_Institution :
Dept. of Electr. Eng., Edinburgh Univ., UK
Volume :
29
Issue :
17
fYear :
1993
Firstpage :
1573
Lastpage :
1574
Abstract :
A test structure that can be used for optimising the focus and exposure of wafer steppers is presented. It consists of a single layer of polysilicon which lends itself to automatic electrical measurement and does not suffer from the apex height reduction which occurs with the previously reported Gaudi structure.<>
Keywords :
focusing; integrated circuit manufacture; photolithography; IC production; automatic electrical measurement; exposure; focus; optimisation; wafer steppers;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19931048
Filename :
234333
Link To Document :
بازگشت