Title :
Improved structure for optimisation of focus and exposure for IC production
Author :
Walton, A.J. ; Fallon, M. ; Stevenson, J.T.M. ; Ross, A.W.S. ; Reeves, C.M.
Author_Institution :
Dept. of Electr. Eng., Edinburgh Univ., UK
Abstract :
A test structure that can be used for optimising the focus and exposure of wafer steppers is presented. It consists of a single layer of polysilicon which lends itself to automatic electrical measurement and does not suffer from the apex height reduction which occurs with the previously reported Gaudi structure.<>
Keywords :
focusing; integrated circuit manufacture; photolithography; IC production; automatic electrical measurement; exposure; focus; optimisation; wafer steppers;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19931048
