DocumentCode :
947594
Title :
InGaAs/GaAs planar doped barrier electron emitters
Author :
Jiang, W.N. ; Hashemi, Mahmood ; Mishra, Umesh K.
Author_Institution :
Dept. of Electr. & Comput. Eng., California Univ., Santa Barbara, CA
Volume :
39
Issue :
11
fYear :
1992
fDate :
11/1/1992 12:00:00 AM
Firstpage :
2649
Abstract :
Summary form only given. Emission from planar doped barrier (PDB) hot electron generators is demonstrated. The PDB structure consists of a sequence of n+-i-δ(p+)-i-n+ layers. The δ(p+) layer is fully depleted, giving rise to a triangular barrier. An applied bias V forward biases the n+-i-δ(p+) junction while reverse biasing the δ(p+)-i-n+ junction, much like the distribution of emitter-collector bias applied to a bipolar transistor with a fully depleted base. The reverse bias potential accelerates the electrons injected over the semiconductor barrier to a maximum kinetic energy determined by the applied potential. The final kinetic energy is lowered by scattering processes. The intrinsic efficiency of emission is therefore determined by quasi-ballistic transport across the acceleration region of the diode
Keywords :
III-V semiconductors; electron field emission; gallium arsenide; hot carriers; indium compounds; vacuum microelectronics; InGaAs-GaAs; PDB structure; acceleration region; fully depleted layer; hot electron generators; maximum kinetic energy; n+-i-δ(p+)-i-n+ layers; planar doped barrier electron emitters; quasi-ballistic transport; reverse bias potential; scattering processes; triangular barrier; Electrodes; Electron emission; Electron guns; Field emitter arrays; Gallium arsenide; Indium gallium arsenide; Kinetic energy; Semiconductor diodes; Silicon; Surface contamination;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.163504
Filename :
163504
Link To Document :
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