DocumentCode
947673
Title
Inversion channel HFET with unity current gain frequency of 14 GHz and surface emitting laser from a single epitaxial growth
Author
Kiely, P.A. ; Evaldsson, P.A. ; Cooke, Patrick ; Taylor, Graham W.
Author_Institution
AT&T Bell Labs., Holmdel, NJ, USA
Volume
29
Issue
17
fYear
1993
Firstpage
1521
Lastpage
1523
Abstract
High speed capability up to 14 GHz is reported for the inversion channel HFET using the inversion channel technology device structure. The transistor is fabricated from the same epitaxial growth and with the same fabrication technology as previously used to demonstrate the vertical cavity double heterostructure optoelectronic switching (DOES) laser.<>
Keywords
field effect integrated circuits; integrated optoelectronics; molecular beam epitaxial growth; semiconductor lasers; 14 GHz; fabrication technology; inversion channel HFET; inversion channel technology device structure; single epitaxial growth; surface emitting laser; unity current gain frequency;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19931013
Filename
234364
Link To Document