Vertically Oriented Titania Nanotubes Prepared by Anodic Oxidation on Si Substrates

Vertically oriented titania nanotube arrays were fabricated by anodization of titanium film deposited on silicon substrates under different processing conditions. The anodic formation of nanoporous titania on silicon substrate was investigated in aqueous solutions mixed with highly corrosive Na₂SO₄/NaF/citric acid. In the result of the anodization of titanium film deposited at room temperature, a very thin layer of ~70 nm having a worm-like structure was grown on the top of the porous layer. But, in the case of titanium film deposited at 500deg, vertically oriented TiO₂ nanotube arrays were formed. The average tube outer diameter of the nanotube was 74 nm to 100 nm. The longest nanotube of 681 mum was obtained at 15 V and 30 min. The current density transient curve recorded during anodization under a constant voltage showed a typical behavior for self-organized pore formation.