DocumentCode :
947702
Title :
High-density optical storage using arsenic nanoclusters in GaAs and AlGaAs
Author :
Melloch, M.R. ; Nolte, David D. ; Woodall, Jerry M.
Author_Institution :
Purdue Univ., West Lafayette, IN
Volume :
39
Issue :
11
fYear :
1992
fDate :
11/1/1992 12:00:00 AM
Firstpage :
2654
Lastpage :
2655
Abstract :
Summary form only given. A novel GaAs-based photorefractive thin-film material with ultrashort transport lengths has been developed. This material consists of As nanoclusters in a high-quality GaAs matrix, denoted GaAs:As. The As clusters act as quantum antidots which exclude the wavefunctions of the electrons and holes. The resulting reduced space of the carrier wavefunctions results in quantum-confined excitons in the GaAs regions between the As clusters. Therefore, GaAs:As exhibits a large electrooptic effect at room temperature for photon energies close to the bandgap. This large electrooptic effect, along with charge trapping on the As clusters, provides a high-density holographic storage medium. The ultrafast lifetimes of the photogenerated carriers due to the As clusters produce excellent spatial resolution during writing of holographic space-charge gratings. Fringe spacings as small as 600 nm were supported in GaAs:As, yielding a volume optical data density greater than 1012 b/cm3
Keywords :
III-V semiconductors; electro-optical devices; gallium arsenide; holographic gratings; holographic storage; photorefractive materials; semiconductor quantum dots; 600 nm; AlGaAs; As nanoclusters; GaAs matrix; charge trapping; electrooptic effect; fringe spacings; high-density holographic storage medium; holographic space-charge gratings; photorefractive thin-film material; quantum antidots; quantum-confined excitons; spatial resolution; ultrafast photogenerated carrier lifetime; ultrashort transport lengths; volume optical data density; Electrooptic effects; Gallium arsenide; Holographic optical components; Holography; Optical materials; Photonic band gap; Photorefractive effect; Photorefractive materials; Transistors; Ultrafast optics;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.163514
Filename :
163514
Link To Document :
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