DocumentCode
948133
Title
Milliampere-range `twice-buried´ AlGaAs-heterolasers fabricated by low-temperature liquid phase epitaxy
Author
Andreev, Viacheslav M. ; Larionov, V.R. ; Rumyantsev, Valery D.
Author_Institution
A.F. Ioffe Phys.-Tech. Inst., Acad. of Sci., St. Petersburg
Volume
39
Issue
11
fYear
1992
fDate
11/1/1992 12:00:00 AM
Firstpage
2663
Lastpage
2664
Abstract
Summary form only given. The authors report on low-threshold quantum-well AlGaAs heterolasers emitting at wavelengths of 730-850 nm. A special LPE (liquid-phase epitaxy) technique has been developed to crystallize thin layer AlGaAs heterostructures in the low-temperature range of 400-600°C. Values of threshold current density as low as 120 A/cm2 at emitting wavelength λ=845 nm and 380 A/cm 2 at λ=760 nm were measured for wide-stripe geometry separate confinement lasers with 15-nm-thick active layers. `Twice-buried´ stripe laser heterostructures were developed to considerably narrow the width of the current channel, to confine the optical mode in lateral directions, and to compensate for the strain tensions in the active layer in order to solve the laser lifetime problem. Threshold currents as low as 2 mA at λ=845 nm and 10 mA at λ=765 nm were measured for `twice-buried´ stripe lasers without reflecting coatings on the facets (CW; T =300 K). The estimated lifetime was over 20000 h at room temperature
Keywords
III-V semiconductors; aluminium compounds; gallium arsenide; liquid phase epitaxial growth; optical workshop techniques; semiconductor growth; semiconductor lasers; 400 to 600 degC; 730 to 850 nm; heterolasers; laser lifetime problem; liquid phase epitaxy; low temperature LPE; low-threshold; milliampere range; quantum-well; semiconductor lasers; separate confinement; strain tension compensation; thin layer AlGaAs heterostructures; threshold current density; twice-buried stripe lasers; wide-stripe geometry; Crystallization; Current measurement; Density measurement; Epitaxial growth; Geometrical optics; Laser modes; Quantum wells; Strain measurement; Threshold current; Wavelength measurement;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.163530
Filename
163530
Link To Document