Title :
The response of a microwave multipolar bucket plasma to a high-voltage pulse with finite rise time
Author :
Qin, Shu ; Chan, Chung
Author_Institution :
Dept. of Electr. & Comput. Eng., Northeastern Univ., Boston, MA, USA
fDate :
10/1/1992 12:00:00 AM
Abstract :
A collisional model that describes the response of a microwave multipolar bucket plasma to a high-voltage pulse with finite risetime has been developed for plasma immersion ion implantation (PIII). The agreement between this model and the measurements of the sheath position and target current in a 100 mtorr helium plasma is found to be much improved when the risetime of the pulse and the ion energy distribution during the PIII process is considered
Keywords :
ion implantation; plasma applications; 100 mtorr; collisional model; finite rise time; high-voltage pulse; ion energy distribution; microwave multipolar bucket plasma; plasma immersion ion implantation; Current measurement; Electrons; Energy measurement; Helium; Plasma density; Plasma immersion ion implantation; Plasma measurements; Plasma sheaths; Plasma waves; Position measurement; Pulse measurements; Semiconductor device doping;
Journal_Title :
Plasma Science, IEEE Transactions on
