Quantifying the value of ownership of yield analysis technologies

Author

Weber, Charles ; Sankaran, Vijay ; Tobin, Kenneth W., Jr. ; Scher, Gary

Author_Institution

Sloan Sch. of Manage., MIT, Cambridge, MA, USA

Volume

15

Issue

4

fYear

2002

fDate

11/1/2002 12:00:00 AM

Firstpage

411

Lastpage

419

Abstract

A model based on information theory, which allows yield managers to determine an optimal portfolio of yield analysis technologies for both the R&D and volume production environments, is presented. The information extraction per experimentation cycle and information extraction per unit time serve as benchmarking metrics for yield learning. They enable yield managers to make objective comparisons of apparently unrelated technologies. Combinations of four yield analysis tools - electrical testing, automatic defect classification, spatial signature analysis and wafer position analysis - are examined in detail to determine the relative value of ownership of different yield analysis technologies.

Keywords

information theory; inspection; integrated circuit modelling; integrated circuit testing; integrated circuit yield; production testing; R&D environments; automatic defect classification; benchmarking metrics; electrical testing; information extraction per experimentation cycle; information extraction per unit time; information theory based model; optimal portfolio; spatial signature analysis; value of ownership; volume production environments; wafer position analysis; yield analysis technologies; yield learning; yield managers; Benchmark testing; Data mining; Environmental management; Information analysis; Information theory; Portfolios; Production; Research and development; Research and development management; Technology management;

fLanguage

English

Journal_Title

Semiconductor Manufacturing, IEEE Transactions on

Publisher

ieee

ISSN

0894-6507

Type

jour

DOI

10.1109/TSM.2002.804876

Filename

1134153