DocumentCode
949028
Title
Treatment of organic wastewater discharged from semiconductor manufacturing process by ultraviolet/hydrogen peroxide and biodegradation
Author
Den, Walter ; KO, Fu-Hsiang ; Huang, Tiao-Yuan
Author_Institution
Nat. Nano Device Labs., Hsinchu, Taiwan
Volume
15
Issue
4
fYear
2002
fDate
11/1/2002 12:00:00 AM
Firstpage
540
Lastpage
551
Abstract
This study investigates the feasibility of using a two-stage process combining a photochemical oxidation process (UV/H2O2) and a biological fluidized-bed system to treat dilate-organic wastewater discharged from semiconductor manufacturing facilities. This combined process has the merits of decomposing recalcitrant organic chemicals into intermediate products more amenable to biodegradation, thereby achieving high degree of mineralization of organic compounds that are otherwise toxic to aerobic biodegradation. Six organic solvents, including propylene glycol methyl ether acetate, ethyl lactate, tetramethylammonium hydroxide, 1-methyl-2-pyrrolidone, isopropanol, and phenol, were evaluated due to their common applications in various wafer fabrication processes. The optimal operating conditions (H2O2 dosage, pH, exposure time) for the first-stage UV/H2O2 were determined for each chemical, and a nominal condition was selected for the ensuing biodegradation, experiments. GC/MS analyses demonstrated that UV/H2O2 indeed decomposed the chemicals into smaller fragments that could be effectively mineralized by aerobic biodegradation.
Keywords
fluidised beds; hydrogen compounds; integrated circuit manufacture; organic compounds; oxidation; semiconductor device manufacture; waste disposal; 1-methyl-2-pyrrolidone; H2O; H2O2; UV/H2O2 process; biodegradation; biological fluidized-bed system; combined process; ethyl lactate; isopropanol; optimal operating conditions; organic wastewater discharge treatment; phenol; photochemical oxidation process; propylene glycol methyl ether acetate; reduction efficiencies; semiconductor manufacturing facilities; tetramethylammonium hydroxide; two-stage process; wafer fabrication processes; Biodegradation; Fluidization; Manufacturing processes; Mineralization; Organic chemicals; Organic compounds; Oxidation; Photochemistry; Production facilities; Wastewater treatment;
fLanguage
English
Journal_Title
Semiconductor Manufacturing, IEEE Transactions on
Publisher
ieee
ISSN
0894-6507
Type
jour
DOI
10.1109/TSM.2002.804903
Filename
1134172
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