DocumentCode
949592
Title
Twin-transverse-junction stripe laser with linear light/current characteristic and low threshold
Author
Thompson, G.H.B. ; Lovelace, D.F. ; Turley, S.E.H.
Author_Institution
Standard Telecommunication Laboratories Limited, Harlow, UK
Volume
15
Issue
4
fYear
1979
Firstpage
133
Lastpage
134
Abstract
Lateral confinement of both light and carriers in the active region is achieved by creating twin transverse junctions with a deep Zn diffusion. The source is a stripe of SiO2 from which the Zn is diffused at low concentration into a highly n-doped double-heterostructure wafer. Threshold currents of around 30¿40 mA have been measured and near and far fields of typically 3 ¿m and 10°, respectively, have been observed (both to half intensity). The optical control achieved results in linear light/current characteristics and zero-order-mode operation.
Keywords
III-V semiconductors; aluminium compounds; gallium arsenide; semiconductor junction lasers; (GaAl)As/GaAs stripe laser; 10 degree beamwidth; 3 micron near field beam width; 30 to 40 mA threshold currents; deep Zn diffusion; highly n-doped DH stripe laser; linear light/current characteristics; low threshold; twin transverse junction stripe laser;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19790097
Filename
4243015
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